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Study of Plasma Parameters and Deposition Rate of Titanium Thin Film in a DC Magnetron Sputtering Method

Published Online: 2022-07-25

Published Print: 2022-05

Authors

Sabavath, G. K.

Swaroop, R.

Singh, J.

Panda, A. B.

Haldar, S.

Rao, N.

Mahapatra, S. K.
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Text and Data Mining valid from 2022-05-01

Version of Record valid from 2022-05-01
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Article History

Received: 6 October 2021

Revised: 21 January 2022

Accepted: 25 January 2022

First Online: 25 July 2022

CONFLICT OF INTEREST

: The authors declare that they have no conflicts of interest.

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