Effect of ion-beam treatment during reactive high-frequency magnetron sputtering on macrostresses in ITO films
Crossref DOI link: https://doi.org/10.1134/S1063782614060177
Published Online: 2014-06-12
Published Print: 2014-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Krylov, P. N.
Zakirova, R. M.
Fedotova, I. V.
Text and Data Mining valid from 2014-06-01
