Structure and optical properties of thin Al2O3 films deposited by the reactive ion-plasma sputtering method on GaAs (100) substrates
Crossref DOI link: https://doi.org/10.1134/S1063782614110256
Published Online: 2014-11-06
Published Print: 2014-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Seredin, P. V.
Goloschapov, D. L.
Lukin, A. N.
Len’shin, A. S.
Bondarev, A. D.
Arsent’ev, I. N.
Vavilova, L. S.
Tarasov, I. S.
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