Adaptation of the model of tunneling in a metal/CaF2/Si(111) system for use in industrial simulators of MIS devices
Crossref DOI link: https://doi.org/10.1134/S1063782615020207
Published Online: 2015-02-05
Published Print: 2015-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Vexler, M. I.
Illarionov, Yu. Yu.
Tyaginov, S. E.
Grasser, T.
Text and Data Mining valid from 2015-02-01