Features of high-frequency measurements of the impedance of metal-insulator-semiconductor structures with an ultrathin oxide
Crossref DOI link: https://doi.org/10.1134/S1063782615040120
Published Online: 2015-04-16
Published Print: 2015-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Goldman, E. I.
Levashova, A. I.
Levashov, S. A.
Chucheva, G. V.
Text and Data Mining valid from 2015-04-01