On a reduction in cracking upon the growth of AlN on Si substrates by hydride vapor-phase epitaxy
Crossref DOI link: https://doi.org/10.1134/S1063782616040217
Published Online: 2016-05-15
Published Print: 2016-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Sharofidinov, Sh. Sh.
Nikolaev, V. I.
Smirnov, A. N.
Chikiryaka, A. V.
Nikitina, I. P.
Odnoblyudov, M. A.
Bugrov, V. E.
Romanov, A. E.
Text and Data Mining valid from 2016-04-01