Study of the distribution profile of iron ions implanted into silicon
Crossref DOI link: https://doi.org/10.1134/S1063782617060185
Published Online: 2017-06-04
Published Print: 2017-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kozhemyako, A. V.
Balakshin, Yu. V.
Shemukhin, A. A.
Chernysh, V. S.
License valid from 2017-06-01