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Effect of the Temporal Characteristics of Modulated DC Plasma with the (SiH4–Ar–O2) Gas Phase on ncl-Si Growth in an a-SiOx:H matrix ($${{C}_{{{{{\text{O}}}_{{\text{2}}}}}}}$$ = 15.5 mol %)

Crossref DOI link: https://doi.org/10.1134/S1063782618100214

Published Online: 2018-09-06

Published Print: 2018-10

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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