Dependence of Mechanical Stresses in Silicon Nitride Films on the Mode of Plasma-Enhanced Chemical Vapor Deposition
Crossref DOI link: https://doi.org/10.1134/S1063782618150095
Published Online: 2019-01-29
Published Print: 2018-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Novak, A. V.
Novak, V. R.
Dedkova, A. A.
Gusev, E. E.
Text and Data Mining valid from 2018-12-01
Article History
Received: 1 December 2016
Accepted: 24 January 2017
First Online: 29 January 2019