FIB Lithography Challenges of Si3N4/GaN Mask Preparation for Selective Epitaxy
Crossref DOI link: https://doi.org/10.1134/S1063782618160212
Published Online: 2019-02-26
Published Print: 2018-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Mitrofanov, M. I.
Levitskii, I. V.
Voznyuk, G. V.
Tatarinov, E. E.
Rodin, S. N.
Lundin, W. V.
Evtikhiev, V. P.
Mizerov, M.N.
Text and Data Mining valid from 2018-12-01
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First Online: 26 February 2019