Deposition of Silicon Films Doped with Boron and Phosphorus by the Gas-Jet Plasma-Chemical Method
Crossref DOI link: https://doi.org/10.1134/S1063782619010184
Published Online: 2019-04-23
Published Print: 2019-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shchukin, V. G.
Sharafutdinov, R. G.
Konstantinov, V. O.
Text and Data Mining valid from 2019-01-01
Article History
Received: 22 May 2018
Accepted: 25 June 2018
First Online: 23 April 2019