Effect of Thermal Annealing on the Photovoltaic Properties of GaP/Si Heterostructures Fabricated by Plasma-Enhanced Atomic Layer Deposition
Crossref DOI link: https://doi.org/10.1134/S1063782619080207
Published Online: 2019-08-07
Published Print: 2019-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Uvarov, A. V.
Zelentsov, K. S.
Gudovskikh, A. S.
Text and Data Mining valid from 2019-08-01
Version of Record valid from 2019-08-01
Article History
Received: 11 April 2019
Revised: 16 April 2019
Accepted: 16 April 2019
First Online: 7 August 2019
CONFLICT OF INTEREST
: The authors have no conflict of interest to declare.