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Investigation of the Influences of Post-Thermal Annealing on Physical Properties of TiO2 Thin Films Deposited by RF Sputtering

Published Online: 2020-03-03

Published Print: 2020-02

Authors

Doghmane, H. E.

Touam, T.

Chelouche, A.

Challali, F.

Bordji, B.
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Text and Data Mining valid from 2020-02-01

Version of Record valid from 2020-02-01
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Article History

Received: 9 May 2019

Revised: 9 October 2019

Accepted: 9 October 2019

First Online: 3 March 2020

CONFLICT OF INTEREST

: The authors declare that they have no conflict of interest.

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