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Diffusion of In Atoms in SiO2 Films Implanted with As+ Ions

Published Online: 2021-04-05

Published Print: 2021-03

Authors

Tyschenko, I. E.

Voelskow, M.

Si, Zh.

Popov, V. P.
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Text and Data Mining valid from 2021-03-01

Version of Record valid from 2021-03-01
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Article History

Received: 19 November 2020

Revised: 27 November 2020

Accepted: 27 November 2020

First Online: 5 April 2021

CONFLICT OF INTEREST

: The authors declare that they have no conflict of interest.

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