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Application of Atomic Layer Deposition for the Formation of Nanostructured ITO/Al2O3 Coatings

Published Online: 2022-02-06

Published Print: 2021-04

Authors

Markov, L. K.

Pavluchenko, A. S.

Smirnova, I. P.

Mesh, M. V.

Kolokolov, D. S.
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Text and Data Mining valid from 2021-04-01

Version of Record valid from 2021-04-01
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Article History

Received: 11 December 2020

Revised: 19 December 2020

Accepted: 19 December 2020

First Online: 6 February 2022

CONFLICT OF INTEREST

: The authors declare that they have no conflict of interest.

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