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Effect of the Chloropentafluoroethane Additive in Chlorine-Containing Plasma on the Etching Rate and Etching-Profile Characteristics of Gallium Arsenide

Crossref DOI link: https://doi.org/10.1134/S1063782621100171

Published Online: 2022-02-14

Published Print: 2021-11

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Okhapkin, A. I.

Kraev, S. A.

Arkhipova, E. A.

Daniltsev, V. M.

Khrykin, O. I.

Yunin, P. A.

Drozdov, M. N.
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Text and Data Mining valid from 2021-11-01

Version of Record valid from 2021-11-01
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Article History

Received: 12 April 2021

Revised: 19 April 2021

Accepted: 19 April 2021

First Online: 14 February 2022

CONFLICT OF INTEREST

: The authors declare that they have no conflicts of interest.

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