Document is current

Any future updates will be listed below

Focused-Ion-Beam Exposure of an Ultrathin Electron-Beam Resist for the Formation of Nanoscale Field-Effect Transistor Contacts

Crossref DOI link: https://doi.org/10.1134/S1063782622130139

Published Online: 2023-04-02

Published Print: 2022-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

About CrossMark