Effect of Bias Voltage and Deposition Rate on the Structure and Coercivity of NiFe Films
Crossref DOI link: https://doi.org/10.1134/S1063783420120094
Published Online: 2021-02-03
Published Print: 2020-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Dzhumaliev, A. S.
Vysotskii, S. L.
Sakharov, V. K.
Text and Data Mining valid from 2020-12-01
Version of Record valid from 2020-12-01
Article History
Received: 30 July 2020
Revised: 30 July 2020
Accepted: 30 July 2020
First Online: 3 February 2021
CONFLICT OF INTEREST
: The authors declare that they have no conflicts of interest.