Crossmark

Effect of Thermal Annealing on the Structural and Electrical Properties of Hafnium Oxide Films

Crossref DOI link: https://doi.org/10.1134/S1063783424601917

Published Online: 2025-01-14

Published Print: 2024-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Pavlikov, A. V. https://orcid.org/0000-0002-1653-5814
Kuchumov, I. D. https://orcid.org/0009-0004-6951-9000
Martyshov, M. N. https://orcid.org/0000-0002-6363-4970
Zhigunov, D. M. https://orcid.org/0000-0003-1714-1208
Ilin, A. S. https://orcid.org/0000-0002-2929-0537
Koroleva, A. V. https://orcid.org/0000-0001-8542-9954
Savchuk, T. P. https://orcid.org/0000-0002-9122-8603
License Information

Text and Data Mining valid from 2024-12-01

Version of Record valid from 2024-12-01
More Information

Article History

Received: 10 October 2024

Revised: 3 November 2024

Accepted: 5 November 2024

First Online: 14 January 2025

CONFLICT OF INTEREST

: The authors of this work declare that they have no conflicts of interest.