Formation of W/HfO2/Si gate structures using in situ magnetron sputtering and rapid thermal annealing
Crossref DOI link: https://doi.org/10.1134/S1063784214050065
Published Online: 2014-05-28
Published Print: 2014-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Bogoyavlenskaya, E. A.
Rudakov, V. I.
Denisenko, Yu. I.
Naumov, V. V.
Rogozhin, A. E.
Text and Data Mining valid from 2014-05-01