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Thickness uniformity of silicon layers grown from a sublimation source by molecular-beam epitaxy

Crossref DOI link: https://doi.org/10.1134/S1063784214110073

Published Online: 2014-11-15

Published Print: 2014-11

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Boldyrevskii, P. B.

Korovin, A. G.

Denisov, S. A.

Svetlov, S. P.

Shengurov, V. G.
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