High-Efficiency Electron Source with a Hollow Cathode in Technologies of Thin Film Deposition and Surface Treatment under Forevacuum Pressures
Crossref DOI link: https://doi.org/10.1134/S1063784218060191
Published Online: 2018-06-29
Published Print: 2018-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shchukin, V. G.
Konstantinov, V. O.
Morozov, V. S.
Text and Data Mining valid from 2018-06-01
Article History
Received: 3 November 2017
First Online: 29 June 2018