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Analytical Model for Atomic-Layer Deposition of Thin Films on the Walls of Cylindrical Holes with a Relatively High Aspect Ratio

Crossref DOI link: https://doi.org/10.1134/S1063784218080054

Published Online: 2018-08-16

Published Print: 2018-08

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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