Plastic Relaxation of Stressed Semipolar AlN($$10\bar {1}1$$) Layer Synthesized on a Nanopatterned Si(100) Substrate
Crossref DOI link: https://doi.org/10.1134/S1063784220120051
Published Online: 2020-12-11
Published Print: 2020-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Bessolov, V. N.
Konenkova, E. V.
Panteleev, V. N.
Text and Data Mining valid from 2020-12-01
Version of Record valid from 2020-12-01
Article History
Received: 25 March 2020
Revised: 15 June 2020
Accepted: 30 June 2020
First Online: 11 December 2020
CONFLICT OF INTEREST
: The author declare that they have no conflicts of interest.