Ion-Beam Lithography: Modelling and Analytical Description of the Deposited in Resist Energy
Crossref DOI link: https://doi.org/10.1134/S1063784224010353
Published Online: 2024-09-02
Published Print: 2024-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shabelnikova, Ya. L.
Zaitsev, S. I.
Text and Data Mining valid from 2024-02-01
Version of Record valid from 2024-02-01
Article History
Received: 25 April 2022
Revised: 25 April 2022
Accepted: 25 April 2022
First Online: 2 September 2024
CONFLICT OF INTEREST
: The authors declare that they have no conflict of interest.