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Parameters of the Modified Tantalum Oxide and Carbide Layers under Stoichiometric Sputtering with Helium Ions

Published Online: 2025-11-08

Published Print: 2025-10

Authors

Manukhin, V. V. https://orcid.org/0000-0002-2661-0689
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Text and Data Mining valid from 2025-10-01

Version of Record valid from 2025-10-01
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Article History

Received: 15 September 2025

Revised: 23 September 2025

Accepted: 23 September 2025

First Online: 8 November 2025

CONFLICT OF INTEREST

: The author of this work declares that he has no conflicts of interest.

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