The Influence of High-Frequency Discharge on Substrate Temperature during Film Deposition
Crossref DOI link: https://doi.org/10.1134/S1063785019050316
Published Online: 2019-06-14
Published Print: 2019-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shirokov, V. B.
Zinchenko, S. P.
Text and Data Mining valid from 2019-05-01
Version of Record valid from 2019-05-01
Article History
Received: 3 December 2018
Revised: 20 February 2019
Accepted: 20 February 2019
First Online: 14 June 2019