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Impact of Oxygen Vacancies on the Formation and Structure of Filaments in SiO2-Based Memristors

Published Online: 2020-05-01

Published Print: 2020-01

Authors

Okulich, E. V.

Okulich, V. I.

Tetel’baum, D. I.
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Text and Data Mining valid from 2020-01-01

Version of Record valid from 2020-01-01
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Article History

Received: 29 July 2019

Revised: 3 October 2019

Accepted: 3 October 2019

First Online: 1 May 2020

CONFLICT OF INTEREST

: The authors declare that they have no conflict of interest.

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