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The Effect of the Growth Temperature on the Passivating Properties of the Al2O3 Films Formed by Atomic Layer Deposition on the CdHgTe Surface

Published Online: 2020-09-15

Published Print: 2020-08

Authors

Gorshkov, D. V.

Sidorov, G. Yu.

Sabinina, I. V.

Sidorov, Yu. G.

Marin, D. V.

Yakushev, M. V.
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Text and Data Mining valid from 2020-08-01

Version of Record valid from 2020-08-01
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Article History

Received: 20 April 2020

Revised: 20 April 2020

Accepted: 22 April 2020

First Online: 15 September 2020

CONFLICT OF INTEREST

: The authors declare that they have no conflict of interest.

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