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The Influence of Metal Masks on Matching of the Lower Electrode and a High-Frequency Bias Generator at Reactive Ion Etching of Large Substrates

Published Online: 2021-12-16

Published Print: 2021-08

Authors

Poletayev, S. D.

Lyubimov, A. I.
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Text and Data Mining valid from 2021-08-01

Version of Record valid from 2021-08-01
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Article History

Received: 25 January 2021

Revised: 12 March 2021

Accepted: 12 March 2021

First Online: 16 December 2021

CONFLICT OF INTEREST

: The authors declare that they have no conflicts of interest.

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