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Effect of the Pressure of Working Gas on the Microcrystalline Structure and Magnetic Properties of the Co Film Deposited with the Aid of Magnetron Sputtering

Crossref DOI link: https://doi.org/10.1134/S1064226918010023

Published Online: 2018-03-08

Published Print: 2018-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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