Plasma chemical etching of high-aspect-ratio silicon micro- and nanostructures
Crossref DOI link: https://doi.org/10.1134/S1070363215050424
Published Online: 2015-06-17
Published Print: 2015-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Amirov, I. I.
Text and Data Mining valid from 2015-05-01