Volatile Heteroligand Complexes of Copper(II): New Precursors for Chemical Vapor Deposition of Copper Films
Crossref DOI link: https://doi.org/10.1134/S1070427218070029
Published Online: 2018-10-16
Published Print: 2018-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Krisyuk, B. V.
Turgambaeva, A. E.
Stabnikov, P. A.
Igumenov, I. K.
Sysoev, S. V.
Rumyantsev, Yu. M.
Prokhorova, S. A.
Maksimovskii, E. A.
Maslova, O. V.
Text and Data Mining valid from 2018-07-01
Article History
Received: 26 April 2018
First Online: 16 October 2018