Hydrogenated silicon oxycarbonitride films. Part III. Thermodynamic modeling of the Si-C-N-O-H system
Crossref DOI link: https://doi.org/10.1134/S1087659615030062
Published Online: 2015-06-17
Published Print: 2015-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Golubenko, A. N.
Fainer, N. I.
Titova, E. F.
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