HIGH-TEMPERATURE ANNEALING OF SILICON SUBOXIDE THIN FILMS OBTAINED BY GAS-JET ELECTRON BEAM PLASMA CHEMICAL VAPOR DEPOSITION
Crossref DOI link: https://doi.org/10.1134/S0021894422050030
Published Online: 2023-02-06
Published Print: 2022-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Baranov, E. A.
Zamchiy, A. O.
Lunev, N. A.
Merkulova, I. E.
Volodin, V. A.
Sharafutdinov, M. R.
Shapovalova, A. A.
Text and Data Mining valid from 2022-11-01
Version of Record valid from 2022-11-01
Article History
Received: 28 February 2022
Revised: 21 March 2022
Accepted: 28 March 2022
First Online: 6 February 2023