Influence of the high-intensity short-pulse implantation of ions on the properties of polycrystalline silicon
Crossref DOI link: https://doi.org/10.1134/S1027451014060068
Published Online: 2014-12-05
Published Print: 2014-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kabyshev, A. V.
Konusov, F. V.
Remnev, G. E.
Pavlov, S. K.
Text and Data Mining valid from 2014-11-01