Simulation of the polymerization process on a silicon surface under plasma-chemical etching in CF4/H2
Crossref DOI link: https://doi.org/10.1134/S1027451015010309
Published Online: 2015-02-05
Published Print: 2015-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Grigoryev, Yu. N.
Gorobchuk, A. G.
Text and Data Mining valid from 2015-01-01