Formation of thin oxide layer on surface of copper caused by implantation of high-energy oxygen ions
Crossref DOI link: https://doi.org/10.1134/S1027451017010293
Published Online: 2017-03-16
Published Print: 2017-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Khaydukov, Yu. N.
Soltwedel, O.
Marchenko, Yu. A.
Khaidukova, D. Yu.
Csik, A.
Acartürk, T.
Starke, U.
Keller, T.
Guglya, A. G.
Kazdayev, Kh. R.
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