Investigation of an ion-implanted semiconductor layer by X-ray fluorescence analysis and ellipsometry
Crossref DOI link: https://doi.org/10.1134/S1027451017020094
Published Online: 2017-04-27
Published Print: 2017-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kalmykov, Sh. A.
License valid from 2017-03-01