Development of Field Alignment Methods for Electron-Вeam Lithography in the Case of X-Ray Bragg–Fresnel Lenses
Crossref DOI link: https://doi.org/10.1134/S1027451018050270
Published Online: 2018-10-09
Published Print: 2018-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Knyazev, M. A.
Svintsov, A. A.
Fahrtdinov, R. R.
Text and Data Mining valid from 2018-09-01
Article History
Received: 14 January 2018
First Online: 9 October 2018