Theoretical Explanation of the Effect of a Decrease in the Si(111) Plasmon Energy during the Implantation of Ions with a Large Dose
Crossref DOI link: https://doi.org/10.1134/S102745102004031X
Published Online: 2020-08-25
Published Print: 2020-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Rysbaev, A. S.
Khujaniyozov, J. B.
Normuradov, M. T.
Tashatov, A. K.
Igamov, B. D.
Abraeva, S. T.
Text and Data Mining valid from 2020-07-01
Version of Record valid from 2020-07-01
Article History
Received: 7 December 2019
Revised: 28 January 2020
Accepted: 30 January 2020
First Online: 25 August 2020