Relaxation modification of the morphology of atomically clean silicon (100) crystal surfaces after treatment with SHF plasma
Crossref DOI link: https://doi.org/10.1134/S1063739716040120
Published Online: 2016-07-14
Published Print: 2016-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yafarov, R. K.
License valid from 2016-07-01