Special Aspects of the Kinetics of Reactive Ion Etching of SiO2 in Fluorine-, Chlorine-, and Bromine-Containing Plasma
Crossref DOI link: https://doi.org/10.1134/S1063739720010060
Published Online: 2020-03-25
Published Print: 2020-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Efremov, A. M.
Murin, D. B.
Betelin, V. B.
Kwon, K.-H.
Text and Data Mining valid from 2020-03-01
Version of Record valid from 2020-03-01
Article History
Received: 19 June 2019
Revised: 30 July 2019
Accepted: 30 July 2019
First Online: 25 March 2020