Influence of Deposition Conditions and Ion-Plasma Treatment of Thin Cobalt Films on Their Electrical Resistivity
Crossref DOI link: https://doi.org/10.1134/S1063739721010030
Published Online: 2021-02-19
Published Print: 2021-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Amirov, I. I.
Selyukov, R. V.
Naumov, V. V.
Gorlachev, E. S.
Text and Data Mining valid from 2021-01-01
Version of Record valid from 2021-01-01
Article History
Received: 8 July 2020
Revised: 16 July 2020
Accepted: 16 July 2020
First Online: 19 February 2021