Influence of Resist Spreading during Its Dry Electron-Beam Etching on a Lateral Resolution
Crossref DOI link: https://doi.org/10.1134/S1063739721010066
Published Online: 2021-02-19
Published Print: 2021-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Isaev, A. G.
Sidorov, F. A.
Rogozhin, A. E.
Text and Data Mining valid from 2021-01-01
Version of Record valid from 2021-01-01
Article History
Received: 15 April 2020
Revised: 29 June 2020
Accepted: 20 August 2020
First Online: 19 February 2021