Formation of Nanosized Structures on the Silicon Surface by a Combination of Focused Ion Beam Methods and Plasma-Chemical Etching
Crossref DOI link: https://doi.org/10.1134/S1063739722030064
Published Online: 2022-07-12
Published Print: 2022-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Klimin, V. S.
Morozova, Yu. V.
Kots, I. N.
Vakulov, Z. E.
Ageev, O. A.
Text and Data Mining valid from 2022-07-12
Version of Record valid from 2022-07-12
Article History
Received: 10 November 2021
Revised: 10 January 2022
Accepted: 11 January 2022
First Online: 12 July 2022