A Study on the Improvement of Etch Uniformity in an Ion Beam Etcher with a Magnetized Inductively Coupled Plasma Source
Crossref DOI link: https://doi.org/10.1134/S1063780X21030053
Published Online: 2021-03-23
Published Print: 2021-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Cheong, H.-W.
Kim, J.-W.
Kim, K.
Lee, H.
Text and Data Mining valid from 2021-03-01
Version of Record valid from 2021-03-01
Article History
Received: 20 July 2020
Revised: 9 September 2020
Accepted: 10 September 2020
First Online: 23 March 2021