Plasma Chemical Etching of Gallium Arsenide in C2F5Cl-Based Inductively Coupled Plasma
Crossref DOI link: https://doi.org/10.1134/S1063782618110180
Published Online: 2018-10-18
Published Print: 2018-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Okhapkin, A. I.
Yunin, P. A.
Drozdov, M. N.
Kraev, S. A.
Skorokhodov, E. V.
Shashkin, V. I.
Text and Data Mining valid from 2018-10-18
Article History
Received: 25 April 2018
First Online: 18 October 2018