Analytical Model of Atomic Layer Deposition of Films on 3D Structures with High Aspect Ratios
Crossref DOI link: https://doi.org/10.1134/S1063784218020123
Published Online: 2018-03-09
Published Print: 2018-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Fadeev, A. V.
Myakon’kikh, A. V.
Rudenko, K. V.
Text and Data Mining valid from 2018-02-01
Article History
Received: 13 June 2017
First Online: 9 March 2018