Deep 3D X-ray Lithography Based on High-Contrast Resist Layers
Crossref DOI link: https://doi.org/10.1134/S1063785019090256
Published Online: 2019-10-02
Published Print: 2019-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Naz’mov, V. P.
Text and Data Mining valid from 2019-09-01
Version of Record valid from 2019-09-01
Article History
Received: 17 May 2019
Revised: 27 May 2019
Accepted: 3 June 2019
First Online: 2 October 2019